Jun 01, 2000 read soft xrays for deep sub100 nm lithography, with and without masks, microelectronic engineering on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. Lithography of computergenerated holograms for freeform and. A zone plate consists of a set of radially symmetric rings, known as fresnel zones, which alternate between opaque and transparent. In modern semiconductor manufacturing, photolithography uses optical radiation to image the mask on a silicon wafer using. Most wafers contain an array of the same pattern, so only one cell of. This section contains assignment and solution files for the course assignments. Fabrication of a fresnel zone plate through electron beam lithographic. These arrays can be useful in applications such as zone plate array lithography, one shot xfel focusing or in combination with a matching array of ordersorting apertures, they can be used to construct a shackhartmann wavefront sensors for beamline diagnosis applications. The method includes the steps of providing an array of photon sources, each of which provides a photon beam, providing an array of focusing elements, each of which focuses an associated photon beam from the array of photon sources onto a substrate, and creating a permanent pattern on a substrate using the array of focusing. Zone plate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns in resist on a substrate. Desktop nanofabrication with massively multiplexed beam pen lithography xing liao1,2, keith a. I explain in a few words how the pointspread function of the zone plate was measured experimentally.
In order that lithographic features which cross boundaries between unit cells are free of stitching errors it is necessary that the zone plates be arranged in the array. Zoneplatearray lithography using synchrotron radiation. Zone plate focused soft xray lithography springerlink. Schematic of the zoneplatearraylithography zpal system. Rajesh menon, amil patel, david chao, mathias galus and professor henry. Smitha department of electrical engineering and computer science, massachusetts institute of technology, cambridge, massachusetts 029 received 6 june 1996. Introduction to electron beam lithography bostjan bercic bostjan. Zoneplatearraylithography is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. Highthroughput synthesis of modified fresnel zone plate. A fzp is a highly dense and symmetric structure, and can.
Resolution enhancement 40 xray lithography mask aligner and stepper 42 xray mask aligner has 2 key components. By scanning the wafer while changing the image, a larger complex image can be realized. The development of a prototype zoneplatearray lithography zpal system by. Read soft xrays for deep sub100 nm lithography, with and without masks, microelectronic engineering on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. Massachusetts institute of technology free online course. This definition appears somewhat frequently and is. Highthroughput synthesis of modified fresnel zone plate arrays via ion beam lithography. A proposal for maskless, zoneplatearray nanolithography mit.
In particular, ion beam lithography ibl is a noteworthy method thanks to its. Electrically switchable fresnel lens using a polymerseparated composite film yunhsing fan, hongwen ren, and shintson wu. Photolithography, also called optical lithography or uv lithography, is a process used in microfabrication to pattern parts on a thin film or the bulk of a substrate also called a wafer. To date, feature sizes of 150nm have been demonstrated with zone plate lithography. Schematic of the zone plate array lithography zpal system.
Zone plate for focused xray beam array lithography. These arrays can be useful in applications such as zone plate array lithography, one shot xfel focusing or in combination with a matching array of ordersorting apertures, they. H calculate the spatial period of the outermost zones of the zone plates designed for operation at the hene wavelength 632. The development of a prototype zoneplatearray lithography. Fabrication of fresnel zone plates for soft xray and. Looking for online definition of zoneplatearraylithography or what zoneplatearraylithography stands for. Fabrication of a fresnel zone plate through electron beam. Authors djomehri, ihsan jahed, 1976downloadfull printable version 3.
Zpalreplaces the printing press of traditional lithography with a technology more akin to that of a laser printer. A zone plate is a device used to focus light or other things exhibiting wave character. Photo plate lithography positive working plates introduction lithography literally means stone writing. The performance of focused soft xray lithography is compared to other direct write methods. Lithography of computergenerated holograms for freeform.
An experimental ultraviolet zpal system has been constructed and used to simultaneously expose nine different patterns with a 333 array of zone plates in a quasidotmatrix fashion. Traditionally lithography employs limestone as the matrix. However, desktop nanofabrication remains a formidable challenge because direct write systems available today, such as those that employ electron beam lithography ebl 1, nearfield optical lithography 27, zone plate array lithography 8, dippen nanolithography 9,10 and related molecular printing techniques 1114, impose tradeoffs between. The printing is from a stone lithographic limestone or a metal plate with a smooth surface. An analytical model of vector formalism is proposed to investigate the diffraction of high numerical aperture subwavelength circular binary phase fresnel zone plate fzp. In further embodiments, an array of apodized diffractive elements may also be used.
For example, scale up a zone plate up by a factor of 400 in a photo editor and print it. We have demonstrated a working zpal system in the uv regime, and are pursuing further experiments with the 4. Nanolithography outlines the present state of the art in lithographic techniques, including. The zones can be spaced so that the diffracted light constructively interferes at the desired focus, creating an image there. Maskless, zone plate array lithography zpal should be capable of producing 25 nm feature sizes at a throughput of 1 cm 2 second using 4. Lithography of computergenerated holograms for freeform and aspheric surface metrology. Assignments submicrometer and nanometer technology. It uses light to transfer a geometric pattern from a photomask also called an. Pdf alphaprototype system for zoneplatearray lithography. Cut new aluminum plate to size be aware of the size of the litho scraper bar when cutting plate, one dimension of the plate should be larger than the scraper bar is wide, taking care to keep grained surface clean and grease free to avoid having to counteretch the plate. Maskless, parallel patterning with zoneplate array lithography d. Assignments mit opencourseware free online course materials.
A simulation tool was built to examine the diffraction properties of zone plates based on scalar diffraction theory. This paper presents the microarray of sifresnel rings fabricated by the electron beam lithography and reactive ion etching. Zone plate lithography focusing x rays tighter focus can be. A lowcost complement or competitor to scanningelectronbeam lithography, microelectronic engineering on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. Zpal is defined as zone plate array lithography somewhat frequently. Fluorescence microscopy imaging with a fresnel zone plate array based optofluidic microscope shuo pang, a chao han, a lap man lee, b and changhuei yang a, b a department of electrical engineering, california institute of technology, pasadena, ca, 91125, usa. Fluorescence microscopy imaging with a fresnel zone plate.
X ray lithography photolithography x ray crystallography. Us7304318b2 system and method for maskless lithography. Zone plates are frequently manufactured using lithography. Zoneplatearray lithography zpal uses an array of zone plates, combined with an array of micromechanical mirrors or shutters, to pattern features on a substrate without a mask. Zone platearray lithography using synchrotron radiation a. Singlebeam scanningelectronbeam lithography sebl systems are widely used in research and some lowvolume manufacturing. Zoneplate array lithography zpal is depicted sche matically in fig. Focusing xrays tighter focus can be achieved with multiple exposures first pattern exposed with ebeam and features filled with gold. At higher doses an exposure spreading phenomenon substantially increases the lateral dimensions of the developed patterns. The system development requires an efficient datadelivery system. Lithography from ancient greek, lithos, meaning stone, and.
By using electron beam lithography, it is possible to make a large number of identical copies of the structure on. A method is disclosed for creating a permanent pattern on a substrate. Scale the zone plate by entering a multiplier for the scale value, save and print the zoneplate, then take a picture of the print. Zoneplatearray lithography using synchrotron radiation a. Introduction electron beam lithography is a specialized technique for creating extremely fine patterns 50 nm. This novel method of lithography combines the economic advantages of a maskless scheme and the high throughput of a massively parallel system as well. Electrically switchable fresnel lens using a polymer. Zoneplatearray lithography zpal and microscopy zpam. Find materials for this course in the pages linked along the left. An array of fresnel zone plates for use in maskless lithography, said array of fresnel zone plates being arranged on a membrane and operable for focusing an energy beam into an array of focal points on a substrate in order to create a permanent pattern thereon. Zoneplatearraylithography what does zoneplatearray.
Recently, microlenses have attracted more attention among optoelectronics device application developers. This cited by count includes citations to the following articles in scholar. A proposal for maskless, zoneplatearray nanolithography henry i. Zoneplatearray lithography zpal is a maskless lithography scheme. This wavelength will allow a large depthoffocus with essentially no proximity effect at a large gap between the zone plate array and the substrate. Outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips. Light hitting the zone plate will diffract around the opaque zones. The areas of each ring, both light and dark, are equal. Zone plate lithography focusing x rays tighter focus can. Desktop nanofabrication with massively multiplexed beam. The stone is then treated or etched with a solution of gum arabic and nitric acid. Zone plate array lithography is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. We propose a novel form of xray projection lithography that.
Zpal is defined as zoneplatearraylithography somewhat frequently. To date, electron beam lithography has been the dominant technique for the fabrication of diffractive focusing optics called fresnel zone plates fzp, even though this preparation method is usually very complicated and is composed of many fabrication steps. Lithography is the transfer of geometric shapes on a mask to a smooth surface. Request pdf immersion zoneplatearray lithography an immersion scheme is used to improve resolution, exposure latitude, and depthoffocus in zone plate array lithography zpal.
The fzps mostly exhibited high quality with zones free from defects. A proposal for maskless, zoneplatearray nanolithography. Alphaprototype system for zone plate array lithography. We present a simulation study which examines the use of zone plates for lithography. Soft xrays for deep sub100 nm lithography, with and without. The ones marked may be different from the article in the profile. Exposure optimization in scanning laser lithography. Maskless, parallel patterning with zoneplate array lithography. Zone plate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate. Once the light reaches the pen array, three structural aspects of the array 6,22 enable it to effectively perform nearfield lithography. Fresnel rings units containing 11 concentric rings were created on the pmma layer with the outermost fresnel ring, having an external diameter of. Highthroughput synthesis of modified fresnel zone plate arrays via. Instead of a single, massive lens, an array of hundreds. Zoneplate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate.
The spatiallight modulator is an array of 1024 grating light valves from silicon light machines, the light source is a 400nm wavelength gan laser, the zone plates of the array are phase zone plates fabricated using sebl and hsq resist. Us20040069957a1 system and method for maskless lithography. Greasy mediums are drawn on the surface of the stone. An array of fresnel zone plates focuses incident radiation into an array of spots on a. In the proposed model, the scattering on the fzps surface, reflection and refraction within groove zones are considered and diffraction fields are calculated using the vector rayleighsommerfeld integral. A significant challenge to the wide utilization of xray microscopy lies in the difficulty in fabricating adequate highresolution optics. Pdf we present the first lithography results that use. Maskless lithography using a multiplexed array of fresnel. Fresnel rings units containing 11 concentric rings were created on the pmma layer with the outermost fresnel ring, having an external diameter of 45. Zone plate array lithography zpal uses an array of zone plates, combined with an array of micromechanical mirrors or shutters, to pattern features on a substrate without a mask. Alan doolittle used for pattern transfer into oxides, metals, semiconductors. Jul 19, 20 once the light reaches the pen array, three structural aspects of the array 6,22 enable it to effectively perform nearfield lithography.
Zone plate array lithography zpal is an opticalmaskless lithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of highnumericalaperture zone plates. Maskless, parallel patterning with zoneplate array. The development of a prototype zoneplatearray lithography zpal system by amil ashok patel submitted to the department of electrical engineering and computer science on may 07, 2004, in partial fulfillment of the requirements for the degree of master of science abstract. Weible,1 michael hornung,2 ralph zoberbier,2 elmar cullmann,2 lorenz stuerzebecher,3 torsten harzendorf,3 and uwe d. Smith research laboratory of electronics, massachusetts institute of technology, cambridge, massachussetts 029 erik h. The spreading mechanism has been identified as the pointspread function of the zone plate lens. Zoneplatearray lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates. Anderson lawrence berkeley laboratory, berkeley, california 94720. Zoneplatearray lithography zpal is an opticalmasklesslithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of highnumericalaperture zone plates.
Maskless, zoneplatearray lithography zpal should be capable of producing 25 nm feature sizes at a throughput of 1 cm 2 second using 4. A maskiess lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. The process itself goes back to 1796 when it was a printing method using ink, metal plates and paper. Multiply the factor the image was scaled up by the focal length of the camera lens. Zone plate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates. This wavelength will allow a large depthoffocus with essentially no proximity effect at a large gap between the zoneplate array and the substrate. The tool has the potential to provide much higher quality cghs and other patternbased metrological. Electron beam lithography ebl became the method of choice for zone plate fabrication with struc. Desktop nanofabrication with massively multiplexed beam pen.
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